Holographic production method supports infrared materials
Using a holographic production method allows for the use of a wide range of infrared materials which do not lend them self to the ruling production process. An interferometrically generated interference pattern is produced from monochromatic light and exposed onto the chosen substrate. Once developed, the resist has a regular sinusoidal profile that is vacuum aluminised at an oblique angle to create the array of parallel conductors.
Available substrates include Calcium Fluoride (CaF2), Barium Fluoride (BaF2), Zinc Selenide (ZnSe) and KRS-5, and have a spacing of 2700 grooves/mm for optimum short-wavelength efficiency.
Holographic wire grid polarisers are available as a standard 25mm diameter, unmounted or in a double protective ring. These parts feature high transmission and high extinction ratios.
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Panasonic
Panasonic PhotoMOS® Photovoltaic MOSFET High-Power Drivers
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| Stock: | 3490 |
| Cost: | $3.95 |
