Ultratech today announced that it has moved Ultratech/Cambridge NanoTech to Waltham, Mass. The new state-of-the-art facility will expand its operations for next-generation atomic layer deposition (ALD) equipment development and enable leading-edge scientific research. After acquiring the assets of Cambridge NanoTech last December, Ultratech invested in a new facility to enhance ALD development. With this new facility, Ultratech/Cambridge NanoTech now has greatly enhanced its capability to develop innovative process technology for ALD applications.
ALD is an enabling technology which provides coatings and material features with significant advantages compared to other existing techniques for depositing precise nanometer-thin films. This technology is expected to be in high demand in volume manufacturing environments for integrated optics, micro-electro-mechanical systems (MEMs), implantable devices in the biomedical sector and batteries and fuel cells in the energy market.
Ultratech Chairman and Chief Executive Officer Arthur W. Zafiropoulo stated, "By creating a new state-of-the-art facility and leveraging the valuable Cambridge NanoTech intellectual property, we have further enhanced our ability to advance the development of next-generation ALD solutions. In addition, we have retained the same team that Cambridge NanoTech customers have worked with in the past. The completion of the new facility marks our successful integration of the Cambridge NanoTech assets into Ultratech's nanotechnology product group. By investing in the expansion of these operations, we expect to generate increased revenue in new and existing markets. Ultratech, and our ALD unit, Ultratech/Cambridge NanoTech, will continue to focus on technology solutions that support our global customers' advanced product and technology roadmaps."